Effects of gate shaping and consequent process changes on AlGaN/GaN HEMT reliability

نویسندگان

  • Janina Möreke
  • Michael J. Uren
  • Yi Pei
  • Umesh K. Mishra
  • Martin Kuball
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The effects of strain relaxation of AlGaN barrier layer on the conduction band profile, electron concentration and two-dimensional gas (2DEG) sheet charge density in a high Al-content AlGaN/GaN high electron mobility transistor (HEMT) are calculated by self-consistently solving Poisson’s and Schrödinger’s equations. The effect of strain relaxation on dc I-V characteristics of AlxGa1−xN/GaN HEMT...

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تاریخ انتشار 2017